NEWS RELEASE

TCZ TO PRESENT ON IMID 2006 CONFERENCE

TCZ has been selected to pesent an invited paper on recent advances in poly silicon crystallization on the IMID 2006 conference to be held in Daegu, Korea from August 22-25, 2006. Most recent results on thin-beam directional x'tallization (TDX) will be presented, a rapid excimer-laser-based crystallization method for creating extremely high-quality large-grained polycristalline silicon films on glass substrates. Experimental data obtained with TCZ's prototype Gen2 tool will be discussed, as well as the ability to produce different types of poly-Si materials.